Reserach Support Services

Home » Research » Research Support Services » Facilities » W.M. Keck Center for Nano-Scale Imaging » W.M. Keck Center Instrumentation

W.M. Keck Center Instrumentation



The Cypher ES is designed for high resolution imaging and Fast Scanning of material surfaces. Two high resolution pieozoelectric scanners capable of measuring areas up to 30 µm x 30 µm with a vertical range of ~ 4 µm are available for imaging. The S-scanner can image samples in air and liquids.  The ES scanner for imaging samples in liquids or controlled gas environments has a gas perfusion cell, liquid perfusion cell, heater sample cell (ambient up to 250 deg C), cooling and heating  sample cell (0-120 deg C), and controlled environment CAFM cell. The instrument has blueDrive for photothermal excitation of the cantilever which provides a clean drive response of the cantilever for tapping mode applications in air and liquids. Sample size is limited to ~ 1 x 1 inch mounted on 15 mm magnetic steel platens. This instrument is in an acoustic and air temperature controlled housing.  Quantitative probe calibration is available on this instrument.  Imaging Modes: Tapping Mode, Contact Mode, Force Spectroscopy, Fast Scanning Tapping Mode, Phase Imaging, Quantitative Nanomechanical Measurements, Scanning Kelvin Probe, CAFM (ORCA and dual gain ORCA), Force Modulation, blueDrive photothermal cantilever excitation, and Imaging in Liquids, controlled gas environments and controlled temperature. 


The Multimode 8 from Bruker Nano is designed for high resolution imaging of material surfaces. A J-pieozoelectric scanner capable of measuring areas up to 120 µm x 120 µm with a vertical range of ~ 5 µm is available for use. Sample size is limited to ~ 1 cm x 1 cm mounted on 10 mm or 12 mm magnetic steel platens. This instrument is on a vibration isolation table.  Quantitative probe calibration is available on this instrument. Imaging Modes: PeakForce Tapping Mode, PeakForce Tapping Mode with ScanAsyst, Force Spectroscopy, Tapping Mode, Contact Mode, Phase Imaging, Quantitative Nanomechanical Measurements, Scanning Kelvin Probe, Conductive Probe (CAFM or TUNA), Force Modulation, Scanning Tunneling Microscopy, and Imaging in Liquids.



The Spinning Disk Confocal on an inverted microscope base with DIC, transmitted light, and epi-Fluorescence.  The system is equipped with two fluorescence laser excitation sources at 488 nm and 561 nm.  The detector is a Photometrics Evolve CCD detector with optional Dual View attachment. Definite Focus is available for maintaining focus during timelapse experiments.  A 150 um piezoelectric Z stage and Eppendorf Transferman micromanipulator are mounted on the system.  A Plan-Neofluar 20X/0.5 NA air, Plan-Neofluar 40X/1.3 NA oil, and a Plan-Apochromat 63X/1.4 NA oil objectives are available. Imaging Modes: DIC, Transmitted Light, Epi-Fluorescence, Confocal Fluorescence and FRET. An OKO Lab enviromental enclosure is on the microscope for temperature, gas (CO2, O2 and air/N2), and humidity control during experiments.


Surface specific fluorescence imaging of samples is generated using evanescent excitation, penetration depth of ~100 nm in the Z direction, on the TIRF Microscope. The Nikon Ti-E TIRF inverted microscope is equipped with 3 excitation sources including 6 excitation wavelengths (408, 457, 477, 488, 514, and 561 nm), an imaging CCD detector (Andor DU 897), and a spectral detection system (Princeton Instruments). The Ti-E is equipped with a perfect focus motorized nosepiece, an additional emission filter wheel, a CFI APO 60x Oil TIRF objective (NA=1.49), and a CFI APO 100x Oil TIRF objective (NA = 1.49). This microscope is capable of detecting single molecule fluorescence. Imaging Modes: Epi-Fluorescence, Objective based Total Internal Reflection Imaging, and Spectral Detector.



The FEI Inspect S SEM is equipped with a tungsten filament, secondary electron detector for standard imaging, a back scattered electron detector, Thermo Noran System Six X-ray microanalysis system (EDS), and a J.C. Nabity Nanometer Pattern Generation Sytem (NPGS) for electron beam patterning and lithography. The SEM will be capable of patterning 80 nm or less line widths. The EDS system provides chemical elemental composition of samples. Additionally the SEM can be operated in environmental mode with variable pressures ranging from 0.6 Torr to 0.08 Torr. Image digital resolution up to 4096 x 3536. Imaging Modes: Secondary Electron Imaging, Back Scattered Electron Imaging, Low Vacuum Imaging, Energy-Dispersive X-ray Spectroscopy (EDS), and J.C. Nabity E-beam Lithography.